China Tantalum Sputtering Target Manufacturers Factory Suppliers
WebStrontium Titanate, SrTiO 3 (Sputtering Target)(Single Crystal Wafers & Substrates) (Fe doped single Crystal)(Nb doped single Crystal) 9: Tantalum (Sputtering Target) 6.5: Tantalum Carbide, TaC...
WebUsing the physical vapor deposition (PVD) process, the tantalum sputter target is “sputtered” onto semiconductor substrates to form a thin film...
WebSputtering Targets: Tantalum, Tungsten, Titanium, AZO, Copper, Aluminum & Platinum | Praxair, Inc. Sputtering Targets SPUTTERING TARGETS FOR THE ELECTRONICS...
WebWe supply pure tungsten sputter target plates at purity levels of up to 99.95% at full density with fine uniform grain size through the thickness. Our pure molybdenum sputter targets are offered...
WebTantalum Sputtering Target. Atomic Number: 73. Composition: Ta. Density: 16.6 g/cc. Melting Point: 5458 °C. Purity: 99.95%, 99.99%. Plasmaterials, Inc. offers tantalum for PVD applications in a...
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